Chamber matching and calibration
US11749543B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 6, 2020 |
| Grant date | Sep 5, 2023 |
| Priority date | — |
| Expiry date | Jul 21, 2041 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P80/30
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method includes receiving a plurality of sets of sensor data associated with a processing chamber of a substrate processing system. Each of the plurality of sets of sensor data comprises a corresponding sensor value of the processing chamber mapped to a corresponding spacing value of the processing chamber. The method further includes providing the plurality of sets of sensor data as input to a trained machine learning model. The method further includes obtaining, from the trained machine learning model, one or more outputs indicative of a health of the processing chamber. The method further includes causing, based on the one or more outputs, performance of one or more corrective actions associated with the processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.