Determining a critical dimension variation of a pattern
US11756188B2 · kind B2 · utility
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14Claims
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Key dates
| Filing date | Mar 14, 2022 |
| Grant date | Sep 12, 2023 |
| Priority date | — |
| Expiry date | Mar 14, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Input data may be received. The input data may include an image of a pattern and location data that identifies a modified portion of the pattern. A processing device may determine a first parameter of a first dimension within the pattern and a second parameter of a second dimension outside of the pattern. A combined set may be generated based on the first parameter and the second parameter. A defect associated with the modified portion may be classified based on the combined set.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.