Reflectance measurement system and method thereof
US11756840B2 · kind B2 · utility
1Cited by
10References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 18, 2019 |
| Grant date | Sep 12, 2023 |
| Priority date | — |
| Expiry date | Jul 20, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8411
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system includes a factory interface, an etching tool, and at least one measuring device. The factory interface is configured to carry a wafer. The etching tool is coupled to the factory interface and configured to process the wafer transferred from the factory interface. The at least one measuring device is equipped in the factory interface, the etching tool, or the combination thereof. The at least one measuring device is configured to perform real-time measurements of reflectance from the wafer that is carried in the factory interface or the etching tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.