Patent · US Active

Hybrid manufacturing of microeletronic assemblies with first and second integrated circuit structures

US11756886B2 · kind B2 · utility

0Cited by
7References
26Claims
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Assignee

Inventors

Key dates

Filing dateDec 8, 2020
Grant dateSep 12, 2023
Priority date
Expiry dateDec 8, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D88/00
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Microelectronic assemblies fabricated using hybrid manufacturing, as well as related devices and methods, are disclosed herein. As used herein, “hybrid manufacturing” refers to fabricating a microelectronic assembly by arranging together at least two IC structures fabricated by different manufacturers, using different materials, or different manufacturing techniques. For example, a microelectronic assembly may include a first IC structure that includes first interconnects and a second IC structure that includes second interconnects, where at least some of the first and second interconnects may include a liner and an electrically conductive fill material, and where a material composition of the liner/electrically conductive fill material of the first interconnects may be different from a material composition of the liner/electrically conductive fill material of the second interconnects.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.