Substrate cleaning apparatus
US11761075B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 25, 2016 |
| Grant date | Sep 19, 2023 |
| Priority date | — |
| Expiry date | Aug 23, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B2205/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate cleaning apparatus that cleans a processing target substrate by blasting the gas clusters to the processing target substrate. The apparatus includes: a chamber configured to accommodate the processing target substrate; a rotary stage configured to rotatably support the processing target substrate in the chamber; an blasting unit configured to blast the gas clusters to the processing target substrate supported by the rotary stage; a driving unit configured to scan a gas cluster-blasted position on the processing target substrate; an exhaust port configured to evacuate the chamber; and a control mechanism configured to control a scattering direction of particles by controlling a rotation direction of the processing target substrate by the rotary stage and a scanning direction of the gas cluster-blasted position, thereby suppressing re-adhesion of the particles to the processing target substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.