Apparatus for processing substrate and method for measuring temperature of substrate
US11774370B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2021 |
| Grant date | Oct 3, 2023 |
| Priority date | — |
| Expiry date | Jan 1, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01K13/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided are an apparatus for processing a substrate and a method for measuring a temperature of the substrate. The apparatus for processing the substrate includes a temperature measurement part and a light-transmitting shield plate. The temperature measurement part includes a light source, a light receiving part configured to receive reflected light reflected by the substrate or the shield plate among the light irradiated from the light source, and a radiant light emitted from the substrate to measure a quantity of the reflected light and an intensity of the radiant light and a temperature calculation part configured to calculate the temperature of the substrate, to which a contamination level of the shield plate is reflected, by using the quantity of the reflected light and the intensity of the radiant light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.