Methods for reflector film growth
US11776980B2 · kind B2 · utility
0Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 13, 2020 |
| Grant date | Oct 3, 2023 |
| Priority date | — |
| Expiry date | Jan 22, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67167
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and apparatus for forming reflector films are described A liner is formed on a substrate surface followed by formation of the reflector layer so that there is no oxygen exposure between liner and reflector layer formation. In some embodiments, a high aspect ratio structure is filled with a reflector material by partially filling the structure with the reflector material while growth is inhibited at a top portion of the structure, reactivating the top portion of the substrate and then filling the structure with the reflector material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.