Patent · US Active

Simultaneous phase-shift point diffraction interferometer and method for detecting wave aberration

US11788829B2 · kind B2 · utility

0Cited by

0References

8Claims

0Family size

Assignee

Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences · CN

Inventors

Peng Feng · Hefei, CN
Zhongliang Li · Beijing, CN
Xiangzhao Wang · Shanghai, CN
Yang Bu · Shanghai, CN

Key dates

Filing date	Apr 25, 2022
Grant date	Oct 17, 2023
Priority date	—
Expiry date	May 7, 2042

Classification

Technology area (CPC G)Physics
CPC primaryG01J2009/0261
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A simultaneous phase-shift point diffraction interferometer and method for detecting wave aberration. The interferometer comprises an ideal spherical wave generation module, an optical system to be measured, an image plane mask, a polarization phase shift module, a two-dimensional polarization imaging photodetector and a data processing unit. Single photodetector is adopted to realize simultaneous detection of more than three phase shift interference patterns, and has the advantages that environmental interference suppression, a flexible optical path, high measurement accuracy, and calibration of system errors of the interferometer may be realized.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.