Substrate processing apparatus
US11791171B2 · kind B2 · utility
0Cited by
4References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 4, 2020 |
| Grant date | Oct 17, 2023 |
| Priority date | — |
| Expiry date | Aug 7, 2040 |
Classification
- Technology area (CPC —)General
Abstract
A substrate processing apparatus according to an aspect of the present disclosure includes a substrate rotating unit, a gas-liquid separator, and an exhaust route. The substrate rotating unit is configured to hold and rotate a substrate. The gas-liquid separator is provided so as to surround an outer circumference of the substrate rotating unit to separate gas and liquid droplets. The exhaust route is provided so as to surround an outer circumference of the gas-liquid separator and discharges the gas separated by the gas-liquid separator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.