Kazuhiro Aiura
20Patents
2h-index
20Co-inventors
53Inventor score
Filing activity: Jan 17, 2012 → Sep 30, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| USD934991S1 | Component of a liquid discharge nozzle for semiconductor substrate processing apparatus | General | 4 | Active |
| US9768010B2 | Liquid treatment apparatus | Electricity | 3 | Active |
| US9640383B2 | Liquid treatment apparatus and liquid treatment method | Electricity | 2 | Active |
| US9105671B2 | Liquid processing apparatus and liquid processing method | Performing Operations; Transporting | 2 | Active |
| USD929534S1 | Liquid discharge nozzle for semiconductor substrate processing apparatus | General | 1 | Active |
| US9245737B2 | Liquid treatment apparatus and liquid treatment method | Electricity | 1 | Active |
| US11024518B2 | Substrate processing apparatus, substrate processing method and recording medium | Electricity | 0 | Active |
| US9064908B2 | Substrate liquid processing apparatus, liquid processing method, and storage medium | Electricity | 0 | Active |
| US11776824B2 | Processing liquid ejection nozzle, nozzle arm, substrate processing apparatus, and substrate processing method | Electricity | 0 | Active |
| US10580669B2 | Substrate processing apparatus and nozzle | Electricity | 0 | Active |
| US9190311B2 | Liquid arm cleaning unit for substrate processing apparatus | Electricity | 0 | Active |
| US9691602B2 | Liquid process apparatus and liquid process method | Emerging Cross-Sectional Technologies | 0 | Active |
| US10486208B2 | Substrate processing apparatus, method of cleaning substrate processing apparatus, and storage medium | Electricity | 0 | Active |
| US9768039B2 | Substrate processing apparatus | Electricity | 0 | Active |
| US11791171B2 | Substrate processing apparatus | General | 0 | Revoked |
| US12142496B2 | Substrate processing apparatus and substrate processing method | Electricity | 0 | Active |
| US12176224B2 | Substrate processing apparatus and substrate processing method | Electricity | 0 | Active |
| US9177838B2 | Liquid process apparatus and liquid process method | Physics | 0 | Active |
| US8865483B2 | Substrate processing apparatus and substrate processing method | Electricity | 0 | Active |
| USD930796S1 | Liquid discharge nozzle for semiconductor substrate processing apparatus | General | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.