In-situ wafer rotation for carousel processing chambers
US11798825B2 · kind B2 · utility
0Cited by
6References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2019 |
| Grant date | Oct 24, 2023 |
| Priority date | — |
| Expiry date | Apr 13, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2221/68309
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Apparatus and methods of processing a substrate in a carousel processing chamber are described. A wafer pedestal has a support surface with a support shaft extending below the wafer pedestal. A roller pinion wheel is below the wafer support around the support shaft. The roller pinion wheel has a plurality of spokes in contact with the support shaft and a wheel with a plurality of roller pinions spaced around the outer periphery of the wheel. Processing chambers incorporating the wafer pedestal and processing methods using the wafer pedestal for in-situ rotation are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.