Patent · US Active

Group VI precursor compounds

US11807653B2 · kind B2 · utility

0Cited by
1References
10Claims
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Assignee

Inventors

Key dates

Filing dateMay 4, 2022
Grant dateNov 7, 2023
Priority date
Expiry dateMay 4, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/32051
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The invention provides a facile process for preparing various Group VI precursor compounds useful in the vapor deposition of such Group VI metals onto solid substrates, especially microelectronic semiconductor device substrates. The process provides an effective means to obtain such volatile materials, which can then be sources of molybdenum, chromium, or tungsten-containing materials to be deposited on such substrates. Additionally, the invention provides a method for vapor deposition of such compounds onto microelectronic device substrates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.