Patent · US Active

Heater assembly with purge gap control and temperature uniformity for batch processing chambers

US11818810B2 · kind B2 · utility

1Cited by

2References

8Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Dhritiman Subha Kashyap · Bengaluru, IN
Amit Rajendra Sherekar · Kanchinakote, IN
Kartik Shah · Saratoga, US
Ashutosh Agarwal · Ghaziabad, IN
Eric J. Hoffmann · San Francisco, US
Sanjeev Baluja · Campbell, US
Vijay D. Parkhe · San Jose, US

Key dates

Filing date	Mar 26, 2021
Grant date	Nov 14, 2023
Priority date	—
Expiry date	Dec 15, 2041

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67103
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A heater assembly having a backside purge gap formed between a top plate and a heater of the heater assembly, the top plate having a top plate wall. The top plate wall having an upper portion, a middle portion and a lower portion, the middle portion forming an incline relative to the top portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.