Hardware switch on main feed line in a radio frequency plasma processing chamber
US11823868B2 · kind B2 · utility
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1References
16Claims
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Assignee
Inventors
Key dates
| Filing date | Jun 11, 2021 |
| Grant date | Nov 21, 2023 |
| Priority date | — |
| Expiry date | Jan 11, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3341
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a radio-frequency (RF) generation system. The RF generation system generally includes an RF generator, and a vacuum interrupter configured to selectively decouple the RF generator from a bias electrode of a plasma chamber based on detection of a fault condition associated with operation of the plasma chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.