Apparatus, system, and method for generating gas for use in a process chamber
US11834740B2 · kind B2 · utility
0Cited by
7References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 10, 2020 |
| Grant date | Dec 5, 2023 |
| Priority date | — |
| Expiry date | Dec 29, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2208/00884
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Embodiments described herein generally relate to apparatus having a canister with a sidewall, a top, and a bottom forming a canister volume. An inlet line and an outlet line is coupled to the top and is in fluid communication with the canister volume. A plate disposed within the canister volume forms a headspace volume below the plate. Each of the inlet line and the outlet line is in fluid communication with the headspace volume. The apparatus includes standoffs extending from a lower surface of the plate. The standoffs include a lower surface area substantially parallel with the plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.