Patent · US Active

Variable loop control feature

US11841692B2 · kind B2 · utility

0Cited by
1References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 16, 2022
Grant dateDec 12, 2023
Priority date
Expiry dateSep 16, 2042

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG05B2219/49023
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A method includes identifying a recipe for depositing layers on a substrate in a processing chamber of a substrate processing system. The recipe comprises iterations of a set of one or more processes, and wherein each iteration of the iterations is for depositing at least one layer of the layers. The method further includes determining changes to parameters for depositing the at least one layer on the substrate. Each of the changes corresponds to a respective iteration of the iterations and is associated with a relative position of a corresponding layer. The layers are to be deposited on one or more substrates based on the recipe and the changes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.