Patent · US Active

Method and apparatus for adaptive alignment

US11842420B2 · kind B2 · utility

0Cited by

3References

20Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Wei Fang · Milpitas, US
Lingling PU · San Jose, US

Key dates

Filing date	Apr 15, 2022
Grant date	Dec 12, 2023
Priority date	—
Expiry date	Apr 15, 2042

Classification

Technology area (CPC G)Physics
CPC primaryG06T2207/30148
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

A method for aligning a wafer image with a reference image, comprising: searching for a targeted reference position on the wafer image for aligning the wafer image with the reference image; and in response to a determination that the targeted reference position does not exist: defining a current lock position and an area that encloses the current lock position on the wafer image; computing an alignment score of the current lock position; comparing the alignment score of the current lock position with stored alignment scores of positions previously selected in relation to aligning the wafer image with the reference image; and aligning the wafer image with the reference image based on the comparison.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.