Growth monitor system and methods for film deposition
US11848202B2 · kind B2 · utility
0Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2021 |
| Grant date | Dec 19, 2023 |
| Priority date | — |
| Expiry date | Nov 30, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0608
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present disclosure generally relates to process chambers for semiconductor processing. In one embodiment, a growth monitor for substrate processing is provided. The growth monitor includes a sensor holder and a crystal disposed in the sensor holder having a front side and a back side. An opening is formed in the sensor holder exposing a front side of the crystal. A gas inlet is disposed through the sensor holder to a plenum formed by the back side of the crystal and the sensor holder. A gas outlet is fluidly coupled to the plenum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.