Selective blocking of metal surfaces using bifunctional self-assembled monolayers

US11848229B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Michael L. McSwiney · Scappoose, US
• Bhaskar Jyoti Bhuyan · San Jose, US
• Mark Saly · Santa Clara, US
• Drew Phillips · New York, US
• Aaron Dangerfield · San Jose, US
• David Thompson · San Jose, US
• Kevin Kashefi · San Ramon, US
• Xiangjin Xie · Fremont, US

Key dates

• Filing date: Oct 21, 2022
• Grant date: Dec 19, 2023
• Expiry date: Oct 21, 2042

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L2221/1063
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Methods for selectively depositing on metallic surfaces are disclosed. Some embodiments of the disclosure utilize a hydrocarbon having at least two functional groups, at least one functional group selected from amino groups, hydroxyl groups, ether linkages or combinations thereof to form a self-assembled monolayer (SAM) on metallic surfaces.