Ampoule for a semiconductor manufacturing precursor
US11859281B2 · kind B2 · utility
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14References
20Claims
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Key dates
| Filing date | Dec 22, 2022 |
| Grant date | Jan 2, 2024 |
| Priority date | — |
| Expiry date | Mar 11, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The ampoules comprise an inlet plenum located between the inlet port and the cavity and an outlet plenum located between the outlet port and the cavity. A flow path is defined by a plurality of tubular walls and an ingress openings of the ampoule, through which a carrier gas flows in contact with the precursor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.