Patent · US Active

Material analysis method

US11859965B2 · kind B2 · utility

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1References
8Claims
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Key dates

Filing dateMay 4, 2022
Grant dateJan 2, 2024
Priority date
Expiry dateSep 8, 2042

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2223/6116
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A material analysis method is provided. A plurality of wafers processed from a plurality of ingots are measured by a measuring instrument to obtain an average of a bow of each of the wafers processed from the ingots and a plurality of full widths at half maximum (FWHM) of each of the wafers. Key factors respectively corresponding to the ingots are calculated according to the FWHM of the wafers. A regression equation is obtained according to the key factors and the average of the bows.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.