Stage system, lithographic apparatus, method for positioning and device manufacturing method
US11860552B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2017 |
| Grant date | Jan 2, 2024 |
| Priority date | — |
| Expiry date | Mar 26, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67288
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.