Substrate supporting unit and a substrate processing device including the same
US11866823B2 · kind B2 · utility
0Cited by
2,210References
20Claims
0Family size
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Key dates
| Filing date | Oct 17, 2022 |
| Grant date | Jan 9, 2024 |
| Priority date | — |
| Expiry date | Oct 17, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6875
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing device capable of preventing deformation of a substrate during a process includes a substrate supporting unit having a contact surface that comes into contact with an edge of a substrate to be processed, wherein the substrate supporting unit includes a protruding (e.g. embossed) structure protruding from a base to support deformation from the inside of the edge of the substrate to be processed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.