HakYong Kwon
7Patents
1h-index
11Co-inventors
37Inventor score
Filing activity: Nov 1, 2019 → Oct 17, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11251040B2 | Cyclical deposition method including treatment step and apparatus for same | Electricity | 1 | Active |
| US11866823B2 | Substrate supporting unit and a substrate processing device including the same | Electricity | 0 | Active |
| US12195855B2 | Gas-phase reactor system including a gas detector | Physics | 0 | Active |
| US11453946B2 | Gas-phase reactor system including a gas detector | Physics | 0 | Active |
| US11499226B2 | Substrate supporting unit and a substrate processing device including the same | Electricity | 0 | Active |
| US11345999B2 | Method of using a gas-phase reactor system including analyzing exhausted gas | Physics | 0 | Active |
| US11814728B2 | Method for filling a gap in a three-dimensional structure on a semiconductor substrate | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.