Imprint compositions with passivated nanoparticles and materials and processes for making the same
US11868043B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 16, 2021 |
| Grant date | Jan 9, 2024 |
| Priority date | — |
| Expiry date | Nov 16, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K9/08
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.