System and method for measuring a sample by x-ray reflectance scatterometry
US11874237B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | Dec 8, 2020 |
| Grant date | Jan 16, 2024 |
| Priority date | — |
| Expiry date | Dec 8, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method for measuring a sample by X-ray reflectance scatterometry. The method may include impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles; and collecting at least a portion of the scattered X-ray beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.