David A. Reed
29Patents
6h-index
19Co-inventors
66Inventor score
Filing activity: Oct 23, 1989 → Jan 15, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5128543A | Particle analyzer apparatus and method | Electricity | 55 | Expired |
| US9588066B2 | Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) | Electricity | 36 | Active |
| US5619034A | Differentiating mass spectrometer | Electricity | 30 | Expired |
| US7411188B2 | Method and system for non-destructive distribution profiling of an element in a film | Electricity | 13 | Active |
| US5103083A | Position sensitive detector and method using successive interdigitated electrodes with different patterns | Electricity | 9 | Expired |
| US7884321B2 | Method and system for non-destructive distribution profiling of an element in a film | Electricity | 7 | Active |
| US11183377B2 | Mass spectrometer detector and system and method using the same | Electricity | 5 | Active |
| US8269167B2 | Method and system for non-destructive distribution profiling of an element in a film | Electricity | 5 | Active |
| US10119925B2 | Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) | Electricity | 5 | Active |
| US10056242B2 | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry | Electricity | 5 | Active |
| US9240254B2 | System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy | Physics | 4 | Active |
| US10481112B2 | Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) | Electricity | 2 | Active |
| US7399963B2 | Photoelectron spectroscopy apparatus and method of use | Electricity | 2 | Active |
| US10859519B2 | Methods and systems for measuring periodic structures using multi-angle x-ray reflectance scatterometry (XRS) | Electricity | 1 | Active |
| US9201030B2 | Method and system for non-destructive distribution profiling of an element in a film | Electricity | 1 | Active |
| US8011830B2 | Method and system for calibrating an X-ray photoelectron spectroscopy measurement | Physics | 1 | Active |
| US8610059B2 | Method and system for non-destructive distribution profiling of an element in a film | Electricity | 1 | Active |
| US10403489B2 | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry | Electricity | 0 | Active |
| US11996259B2 | Patterned x-ray emitting target | Electricity | 0 | Active |
| US9297771B2 | Methods and systems for fabricating platelets of a monochromator for X-ray photoelectron spectroscopy | Emerging Cross-Sectional Technologies | 0 | Active |
| US8916823B2 | Method and system for non-destructive distribution profiling of an element in a film | Electricity | 0 | Active |
| US11430647B2 | Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry | Electricity | 0 | Active |
| US11874237B2 | System and method for measuring a sample by x-ray reflectance scatterometry | Electricity | 0 | Active |
| US10910208B2 | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry | Electricity | 0 | Active |
| US12165863B2 | Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.