Patent · US Active

Method and apparatuses for disposing of excess material of a photolithographic mask

US11874598B2 · kind B2 · utility

0Cited by

4References

15Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Michael Budach · Hanau, DE
Christof Baur · Darmstadt, DE
Klaus Edinger · Lorsch, DE
Tristan Bret · Darmstadt, DE

Key dates

Filing date	Dec 2, 2019
Grant date	Jan 16, 2024
Priority date	—
Expiry date	Jun 2, 2041

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB08B7/026
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

The present application relates to a method for disposing of excess material of a photolithographic mask, wherein the method comprises the following steps: (a) enlarging a surface of the excess material; (b) displacing the enlarged excess material on the photolithographic mask using at least one first probe of a scanning probe microscope; and (c) removing the displaced enlarged excess material from the photolithographic mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.