Apparatus for and method of reducing contamination from source material in an EUV light source
US11874608B2 · kind B2 · utility
0Cited by
6References
26Claims
0Family size
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Key dates
| Filing date | Oct 21, 2019 |
| Grant date | Jan 16, 2024 |
| Priority date | — |
| Expiry date | Aug 10, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a source for and method of generating extreme ultraviolet radiation in which spitting of molten target material is hindered through depletion of the number of hydrogen radicals available to enter deposits of molten target material and create hydrogen bubbles therein by introducing an active gas that reacts with the hydrogen radicals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.