Common substrate and shadow ring lift apparatus
US11881375B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 15, 2021 |
| Grant date | Jan 23, 2024 |
| Priority date | — |
| Expiry date | Jul 14, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3328
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments of a lift apparatus for use in a substrate processing chamber are provided herein. In some embodiments, a lift apparatus includes: a plurality of first lift pin assemblies configured to raise or lower a substrate having a given diameter when disposed thereon, wherein each of the first lift pin assemblies includes a first lift pin disposed on a first bellows assembly; a plurality of second lift pin assemblies arranged in a circle having a diameter greater than the given diameter and configured to raise or lower an annular chamber component, wherein each of the second lift pin assemblies includes a second lift pin disposed on a second bellows assembly; an actuator; and a lift assembly coupled to the actuator and configured to raise or lower each of the first lift pin assemblies and the second lift pin assemblies by movement of the actuator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.