Patent · US Active

Apparatus and method for removing a single particulate from a substrate

US11886126B2 · kind B2 · utility

0Cited by

5References

39Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Klaus Edinger · Lorsch, DE
Christian Felix Hermanns · Frankfurt am Main, DE
Tilo Sielaff · Darmstadt, DE
Jens Oster · Ober-Ramstadt, DE
Christof Baur · Darmstadt, DE
Maksym Kompaniiets · Weißenhorn, DE

Key dates

Filing date	Jul 7, 2021
Grant date	Jan 30, 2024
Priority date	—
Expiry date	Jul 7, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG06N20/00
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The present application relates to an apparatus and to a method for removing at least a single particulate from a substrate, especially an optical element for extreme ultraviolet (EUV) photolithography, wherein the apparatus comprises: (a) an analysis unit designed to determine at least one constituent of a material composition of the at least one single particulate; and (b) at least one gas injection system designed to provide a gas matched to the particular constituent in an environment of the at least one single particulate; (c) wherein the matched gas contributes to removing the at least one single particulate from the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.