Patent · US Active

Injector configured for arrangement within a reaction chamber of a substrate processing apparatus

US11891696B2 · kind B2 · utility

0Cited by
2,210References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 24, 2021
Grant dateFeb 6, 2024
Priority date—
Expiry dateApr 8, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67115
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The invention relates to an injector configured for arrangement within a reaction chamber of a substrate processing apparatus to inject gas in the reaction chamber. The injector may be elongated along a first axis and configured with an internal gas conduction channel extending along the first axis and provided with at least one gas entrance opening and at least one gas exit opening. The injector may have a width extending along a second axis perpendicular to the first axis substantially larger than a depth of the injector extending along a third axis perpendicular to the first and second axis. The wall of the injector may have a varying thickness.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.