Lucian Jdira
20Patents
5h-index
38Co-inventors
65Inventor score
Filing activity: Jan 21, 2011 → Jul 5, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10103040B1 | Apparatus and method for manufacturing a semiconductor device | Electricity | 450 | Active |
| US8398773B2 | Thermal processing furnace and liner for the same | Electricity | 448 | Active |
| US9153466B2 | Wafer boat | Electricity | 7 | Active |
| US10683571B2 | Gas supply manifold and method of supplying gases to chamber using same | Electricity | 6 | Active |
| US10954597B2 | Atomic layer deposition apparatus | Electricity | 5 | Active |
| US10900122B2 | Apparatus for semiconductor wafer processing | Chemistry; Metallurgy | 5 | Active |
| US10844484B2 | Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods | Electricity | 5 | Active |
| US11230766B2 | Substrate processing apparatus and method | Electricity | 3 | Active |
| US10605530B2 | Assembly of a liner and a flange for a vertical furnace as well as the liner and the vertical furnace | Electricity | 2 | Active |
| US10343907B2 | Method and system for delivering hydrogen peroxide to a semiconductor processing chamber | Electricity | 2 | Active |
| US11891696B2 | Injector configured for arrangement within a reaction chamber of a substrate processing apparatus | Electricity | 0 | Active |
| US12243757B2 | Flange and apparatus for processing substrates | Mechanical Engineering; Lighting; Heating | 0 | Active |
| US12195852B2 | Substrate processing apparatus with an injector | Electricity | 0 | Active |
| US11830730B2 | Layer forming method and apparatus | Electricity | 0 | Active |
| US11971217B2 | Batch furnace assembly and method of operating a batch furnace assembly | Mechanical Engineering; Lighting; Heating | 0 | Active |
| US12366410B2 | Apparatus for processing a plurality of substrates provided with an extractor chamber | Mechanical Engineering; Lighting; Heating | 0 | Active |
| US10858738B2 | Wafer boat cooldown device | Electricity | 0 | Active |
| US9431238B2 | Reactive curing process for semiconductor substrates | Electricity | 0 | Active |
| US12412759B2 | Substrate processing apparatus, reactor mover for moving a reactor of the apparatus and method of maintaining the reactor of the apparatus | Electricity | 0 | Active |
| US12077854B2 | Chemical vapor deposition furnace with a cleaning gas system to provide a cleaning gas | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.