Patent · US Active

Yttrium oxide based coating composition

US11920234B2 · kind B2 · utility

0Cited by
10References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 28, 2022
Grant dateMar 5, 2024
Priority date
Expiry dateDec 28, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67213
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Described herein is a protective coating composition that provides erosion and corrosion resistance to a coated article (such as a chamber component) upon the article's exposure to harsh chemical environment (such as hydrogen based and/or halogen based environment) and/or upon the article's exposure to high energy plasma. Also described herein is a method of coating an article with the protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits, on average, less than about 5 yttrium based particle defects per wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.