Plasma processing apparatus and plasma processing method
US11923177B2 · kind B2 · utility
0Cited by
3References
13Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 6, 2021 |
| Grant date | Mar 5, 2024 |
| Priority date | — |
| Expiry date | Jul 6, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32577
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus includes: a processing container having a vertical tubular shape and an opening formed in a side wall of the processing container, the processing container configured to accommodate a plurality of substrates in multiple stages; a plasma partition wall airtightly provided on an outer wall of the processing container and configured to cover the opening and define a plasma generation space; a plasma electrode provided along the plasma partition wall; and a processing gas supplier provided outside the plasma generation space and configured to supply a plasma generation gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.