Patent · US Active

Reactant vaporizer and related systems and methods

US11926894B2 · kind B2 · utility

0Cited by
57References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 3, 2017
Grant dateMar 12, 2024
Priority date
Expiry dateJul 17, 2040

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/45544
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.