Eric James Shero
123Patents
30h-index
104Co-inventors
93Inventor score
Filing activity: Oct 31, 1991 → Oct 12, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9017481B1 | Process feed management for semiconductor substrate processing | Electricity | 716 | Active |
| US7122085B2 | Sublimation bed employing carrier gas guidance structures | Chemistry; Metallurgy | 563 | Expired |
| US8137462B2 | Precursor delivery system | Chemistry; Metallurgy | 546 | Active |
| US7601225B2 | System for controlling the sublimation of reactants | Chemistry; Metallurgy | 541 | Expired |
| USD614153S1 | Reactant source vessel | General | 538 | Expired |
| US8216380B2 | Gap maintenance for opening to process chamber | Electricity | 538 | Active |
| US8309173B2 | System for controlling the sublimation of reactants | Chemistry; Metallurgy | 536 | Active |
| US7851019B2 | Method for controlling the sublimation of reactants | Chemistry; Metallurgy | 532 | Active |
| US8287648B2 | Method and apparatus for minimizing contamination in semiconductor processing chamber | Electricity | 530 | Active |
| US9005539B2 | Chamber sealing member | Electricity | 529 | Active |
| US8877655B2 | Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species | Electricity | 529 | Active |
| US8986456B2 | Precursor delivery system | Chemistry; Metallurgy | 528 | Active |
| US8883270B2 | Systems and methods for thin-film deposition of metal oxides using excited nitrogen—oxygen species | Chemistry; Metallurgy | 527 | Active |
| US8841182B1 | Silane and borane treatments for titanium carbide films | Electricity | 513 | Active |
| US9202727B2 | Susceptor heater shim | Electricity | 506 | Active |
| US9228259B2 | Method for treatment of deposition reactor | Electricity | 497 | Active |
| US9394608B2 | Semiconductor processing reactor and components thereof | Emerging Cross-Sectional Technologies | 487 | Active |
| US9574268B1 | Pulsed valve manifold for atomic layer deposition | Electricity | 471 | Active |
| US9892908B2 | Process feed management for semiconductor substrate processing | Electricity | 456 | Active |
| US10087522B2 | Deposition of metal borides | Chemistry; Metallurgy | 447 | Active |
| US7795160B2 | ALD of metal silicate films | Electricity | 396 | Active |
| US10276355B2 | Multi-zone reactor, system including the reactor, and method of using the same | Electricity | 396 | Active |
| US6613695B2 | Surface preparation prior to deposition | Electricity | 220 | Expired |
| US7118779B2 | Reactor surface passivation through chemical deactivation | Performing Operations; Transporting | 132 | Expired |
| US7914847B2 | Reactor surface passivation through chemical deactivation | Chemistry; Metallurgy | 98 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.