Method and device for characterizing the surface shape of an optical element
US11927500B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 14, 2022 |
| Grant date | Mar 12, 2024 |
| Priority date | — |
| Expiry date | Apr 14, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/2441
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods for characterizing the surface shapes of optical elements include the following steps: carrying out, in an interferometric test arrangement, at least a first interferogram measurement on the optical element by superimposing a test wave, which has been generated by diffraction of electromagnetic radiation on a diffractive element and has been reflected at the optical element, carrying out at least one additional interferogram measurement on in each case one calibrating mirror for determining calibration corrections, and determining the deviation from the target shape of the optical element based on the first interferogram measurement carried out on the optical element and the determined calibration corrections. At least two interferogram measurements are carried out for the at least one calibrating mirror, which differ from one another with regard to the polarization state of the electromagnetic radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.