Patent · US Active

Method and device for characterizing the surface shape of an optical element

US11927500B2 · kind B2 · utility

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1References
24Claims
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Key dates

Filing dateApr 14, 2022
Grant dateMar 12, 2024
Priority date
Expiry dateApr 14, 2042

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B11/2441
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Methods for characterizing the surface shapes of optical elements include the following steps: carrying out, in an interferometric test arrangement, at least a first interferogram measurement on the optical element by superimposing a test wave, which has been generated by diffraction of electromagnetic radiation on a diffractive element and has been reflected at the optical element, carrying out at least one additional interferogram measurement on in each case one calibrating mirror for determining calibration corrections, and determining the deviation from the target shape of the optical element based on the first interferogram measurement carried out on the optical element and the determined calibration corrections. At least two interferogram measurements are carried out for the at least one calibrating mirror, which differ from one another with regard to the polarization state of the electromagnetic radiation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.