Optical objective for operation in EUV spectral region
US11934105B2 · kind B2 · utility
1Cited by
22References
44Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 17, 2019 |
| Grant date | Mar 19, 2024 |
| Priority date | — |
| Expiry date | Mar 13, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B17/0663
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N>1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.