Daniel Gene Smith
51Patents
4h-index
30Co-inventors
62Inventor score
Filing activity: Oct 5, 2006 → May 4, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9638799B2 | Scan mirrors for laser radar | Emerging Cross-Sectional Technologies | 72 | Active |
| US9618619B2 | Radar systems with dual fiber coupled lasers | Physics | 7 | Active |
| US8724095B2 | Optical assembly for laser radar | Physics | 6 | Active |
| US7982884B2 | Autofocus system with error compensation | Physics | 4 | Active |
| US10139492B2 | Radar systems with dual fiber coupled lasers | Physics | 3 | Active |
| US8829420B2 | Two dimensional encoder system and method | Physics | 3 | Active |
| US9625368B2 | Apparatus, optical assembly, method for inspection or measurement of an object and method for manufacturing a structure | Physics | 3 | Active |
| US9587977B2 | Boresight error monitor for laser radar integrated optical assembly | Physics | 2 | Active |
| US11982521B2 | Measurement of a change in a geometrical characteristic and/or position of a workpiece | Physics | 2 | Active |
| US8582119B2 | Large scale metrology apparatus and method | Physics | 2 | Active |
| US11061338B2 | High-resolution position encoder with image sensor and encoded target pattern | Electricity | 1 | Active |
| US10197668B2 | Eighth wave corner cube retarder for laser radar | Physics | 1 | Active |
| US10295911B2 | Extreme ultraviolet lithography system that utilizes pattern stitching | Physics | 1 | Active |
| US10837763B2 | Optical assembly, method for producing data in the same, and method for manufacturing structure | Physics | 1 | Active |
| US9243901B2 | Rules for reducing the sensitivity of fringe projection autofocus to air temperature changes | Physics | 1 | Active |
| US10747117B2 | Extreme ultraviolet lithography system that utilizes pattern stitching | Physics | 1 | Active |
| US10890849B2 | EUV lithography system for dense line patterning | Physics | 1 | Active |
| US8736813B2 | Exposure apparatus with an illumination system generating multiple illumination beams | Physics | 1 | Active |
| US9360347B2 | Two-dimensional encoder system and method | Physics | 1 | Active |
| US11934105B2 | Optical objective for operation in EUV spectral region | Physics | 1 | Active |
| US9074911B2 | Measurement system and method utilizing high contrast encoder head for measuring relative movement between objects | Physics | 1 | Active |
| US8842296B2 | Methods and devices for reducing errors in Goos-Hänchen corrections of displacement data | Physics | 1 | Active |
| US7612892B2 | Imaging optical system configured with through the lens optics for producing control information | Physics | 1 | Active |
| US11099483B2 | Euv lithography system for dense line patterning | Physics | 1 | Active |
| US11300884B2 | Illumination system with curved 1d-patterned mask for use in EUV-exposure tool | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.