Systems and methods for cleaning an edge ring pocket
US11935730B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 22, 2020 |
| Grant date | Mar 19, 2024 |
| Priority date | — |
| Expiry date | Mar 19, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68735
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Systems and methods for cleaning an edge ring pocket are described herein. One of the methods includes providing one or more process gases to a plasma chamber, supplying a low frequency (LF) radio frequency (RF) power to an edge ring that is located adjacent to a chuck of the plasma chamber. The LF RF power is supplied while the one or more process gases are supplied to the plasma chamber to maintain plasma within the plasma chamber. The supply of the LF RF power increases energy of plasma ions near the edge ring pocket to remove residue in the edge ring pocket. The LF RF power is supplied during the time period in which a substrate is not being processed within the plasma chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.