Reticle processing system
US11940724B2 · kind B2 · utility
0Cited by
7References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2020 |
| Grant date | Mar 26, 2024 |
| Priority date | — |
| Expiry date | Nov 4, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7096
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided herein are apparatus, systems and methods for processing reticle blanks. A reticle processing system includes a support assembly having a plate coupled to a frame, and a carrier base assembly supported on the support assembly. The carrier base assembly comprises a wall extending from a top surface of the carrier base and defining a containment region for a reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.