Patent · US Active

Runout and wobble measurement fixtures

US11946137B2 · kind B2 · utility

0Cited by
2,211References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 13, 2021
Grant dateApr 2, 2024
Priority date
Expiry dateMar 16, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67259
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A fixture is provided. The fixture includes a base, a turntable, a first sensor, and a second sensor. The turntable is supported on the base, is rotatable about a rotation axis, and is configured to slidably seat a susceptor assembly for rotation about the rotation axis. The first sensor is fixed relative to the base, is radially offset from the rotation axis, and is configured to determine ex-situ runout of the susceptor assembly. The second sensor is fixed relative to the first sensor, is axially offset from the first sensor, and is configured to determine ex-situ wobble of the susceptor assembly. Fixture arrangements and methods of determining ex-situ runout and ex-situ wobble of susceptor assemblies for semiconductor processing systems are also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.