Plasma excitation with ion energy control
US11967483B2 · kind B2 · utility
1Cited by
431References
26Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 2, 2021 |
| Grant date | Apr 23, 2024 |
| Priority date | — |
| Expiry date | Aug 13, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/327
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments provided herein generally include apparatus, plasma processing systems and methods for generation of a waveform for plasma processing of a substrate in a processing chamber. One embodiment includes a waveform generator having a voltage source selectively coupled to an output node, where the output node is configured to be coupled to an electrode disposed within a processing chamber, and where the output node is selectively coupled to a ground node. The waveform generator may also include a radio frequency (RF) signal generator, and a first filter coupled between the RF signal generator and the output node.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.