Optical etendue matching methods for extreme ultraviolet metrology
US11968772B2 · kind B2 · utility
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2References
37Claims
0Family size
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Key dates
| Filing date | Apr 29, 2020 |
| Grant date | Apr 23, 2024 |
| Priority date | — |
| Expiry date | Oct 16, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2007/005
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical characterization system is disclosed. The optical characterization system may comprise a synchrotron source, an optical characterization sub-system, and a sensor configured to receive a projected image from a set of imaging optics. The optical characterization sub-system may include at least the set of illumination optics, a set of imaging optics, and a diffractive optical element, a temporal modulator or an optical waveguide configured to match an etendue of a light beam output by the synchrotron source to the set of illumination optics. A method of matching the etendue of a light beam is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.