Substrate pedestal for improved substrate processing
US11984305B2 · kind B2 · utility
0Cited by
4References
20Claims
0Family size
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Key dates
| Filing date | Jan 2, 2023 |
| Grant date | May 14, 2024 |
| Priority date | — |
| Expiry date | Jan 2, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24564
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate pedestal includes a thermally conductive substrate support including a mesh, a thermally conductive shaft including a plurality of conductive rods therein, each conductive rod having a first end and a second end, and a sensor. The first end of each conductive rod is electrically coupled to the mesh, and the sensor is disposed between the first and second ends of each conductive rod and configured to detect current flow through each conductive rod.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.