Method of manufacturing semiconductors using fluid delivery system
US11990354B2 · kind B2 · utility
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15References
19Claims
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Key dates
| Filing date | Aug 12, 2022 |
| Grant date | May 21, 2024 |
| Priority date | — |
| Expiry date | Aug 12, 2042 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/5283
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
A substrate block for a fluid delivery system is provided, the substrate block having an upper surface. The upper surface has an inlet substrate port and an outlet substrate port formed into the upper surface. A substrate fluid passageway extends from the inlet substrate port and the outlet substrate port. The substrate fluid passageway extends in a smooth arc which is free of corners or angular walls.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.