Real-time, non-invasive IEDF plasma sensor
US11996274B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 7, 2022 |
| Grant date | May 28, 2024 |
| Priority date | — |
| Expiry date | Sep 28, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3299
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A controller for a plasma generation system includes a model evaluation module receives a sensed value that varies in accordance with a state of a plasma controlled by a RF power generator. The model evaluation module generates a plasma parameter that varies in accordance with the sensed value. A model integration module receives the plasma parameter, integrates the plasma parameter, and outputs an integrated model parameter. An IEDF evaluation module receives the integrated model parameter and generates an ion energy distribution function (IEDF) in accordance with the integrated model parameter. An IEDF controller module receives the IEDF and generates a signal for controlling a RF generator. A RF generator control module receives the signal and generates an RF generator control signal to control at least one of power, frequency, or phase of the RF power generator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.