Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner
US12000041B2 · kind B2 · utility
0Cited by
19References
20Claims
0Family size
Assignee
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Key dates
| Filing date | May 31, 2023 |
| Grant date | Jun 4, 2024 |
| Priority date | — |
| Expiry date | May 31, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8427
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method includes receiving light, by a light coupling device and along an optical path, reflected back from a reflector mounted on a liner of a processing chamber. The method further includes detecting, by a spectrometer within the received light, a first spectrum representative of a deposited film layer on the reflector. The method further includes aligning, using an alignment device, the light coupling device in two dimensions with reference to the reflector along the optical path until maximization of the light received by the light coupling device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.