Inventor · Sunnyvale, CA, US

Patrick Tae

17Patents
1h-index
40Co-inventors
46Inventor score

Filing activity: Mar 19, 2018 → Jul 9, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US11708635B2 Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner Physics 3 Active
US11284018B1 Smart camera substrate Electricity 1 Active
US11781214B2 Differential capacitive sensors for in-situ film thickness and dielectric constant measurement Electricity 1 Active
US12009191B2 Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wall Electricity 0 Active
US12000041B2 Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner Physics 0 Active
US12418972B2 Confocal chromatic metrology for EUV source condition monitoring Electricity 0 Active
US12123090B2 Differential capacitive sensor for in-situ film thickness and dielectric constant measurement Electricity 0 Active
US12163911B2 Capacitive sensor housing for chamber condition monitoring Electricity 0 Active
US11736818B2 Smart camera substrate Electricity 0 Active
US12432461B2 Smart camera substrate Electricity 0 Active
US11415538B2 Capacitive sensor housing for chamber condition monitoring Electricity 0 Active
US12031910B2 Transmission corrected plasma emission using in-situ optical reflectometry Physics 0 Active
US11545346B2 Capacitive sensing data integration for plasma chamber condition monitoring Electricity 0 Active
US12009236B2 Sensors and system for in-situ edge ring erosion monitor Electricity 0 Active
US11581206B2 Capacitive sensor for chamber condition monitoring Physics 0 Active
US11551905B2 Resonant process monitor Electricity 0 Active
US12114083B2 Smart camera substrate Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.